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Product Description
Sapphire wafer used as semiconductor materials
? Standard Sapphire Wafer
Orientation: C-axis (0001)
Diameter: 1’’ 2’’ 3’’ 4’’ 5’’ 6’’
Surface roughness: Epi-Polished, Ra?0.2nm
Class 100 Clean room cleaning and vacuum nitrogen packaging
? Sapphire wafer with different orientation and off cut, semi-polar /non-polar
Orientation: A-axis(1120) ±0.1°
Orientation: R-axis(1102) ±0.1°
Orientation: M-axis(1010) ±0.1°
Orientation: C-plane off-cut 0.5~4 degree toward A-plane/ M-plane
Diameter: 50.8 +/- 0.1mm (2inch)
Thickness: 430 +/-25um
Surface roughness: Epi-Polished, Ra?0.2nm
Class 100 Clean room cleaning and vacuum nitrogen packaging.
www.helioswafer.com
edytian@helioswafer.com
HELIOS Company focus on processing of semiconductor wafer and optical window, we provide customers a complete solution with superior products and excellent consulting services.
We’ve been working closely with many universities, research organizations, and companies in and out of China, facilitating their technological innovations by quality products, exceptional service, competitive pricing and on-time delivery.
Main products:
Sapphire wafer
Gallium nitride (GaN) wafer
Silicon Carbide (SiC) wafer
Piezoelectric Quartz crystal
Blue/ green LED wafer
